EXTRINSIC‐INTRINSIC STACKING‐FAULT PAIRS IN EPITAXIAL SILICON
نویسندگان
چکیده
منابع مشابه
Epitaxial La-doped SrTiO3 on silicon: A conductive template for epitaxial ferroelectrics on silicon
Use of an epitaxial conducting template has enabled the integration of epitaxial ferroelectric perovskites on silicon. The conducting template layer, LaxSr12xTiO3 ~LSTO!, deposited onto ~001! silicon wafers by molecular-beam epitaxy is then used to seed $001%-oriented epitaxial perovskite layers. We illustrate the viability of this approach using PbZr0.4Ti0.6O3 ~PZT! as the ferroelectric layer ...
متن کاملEpitaxial diamond-hexagonal silicon nano-ribbon growth on (001) silicon
Silicon crystallizes in the diamond-cubic phase and shows only a weak emission at 1.1 eV. Diamond-hexagonal silicon however has an indirect bandgap at 1.5 eV and has therefore potential for application in opto-electronic devices. Here we discuss a method based on advanced silicon device processing to form diamond-hexagonal silicon nano-ribbons. With an appropriate temperature anneal applied to ...
متن کاملEpitaxial growth of non-cubic silicon
We report about the formation of a Si twinning-superlattice (TSL). Si layers containing 1808 rotation twin boundaries arranged periodical along the [111] direction and only separated by 2.5 nm (corresponding to TSL) have been prepared by molecular beam epitaxy. The method consists of repeating of several growth and annealing circles on boron(B)-predeposited undoped Si substrates. It is shown th...
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ژورنال
عنوان ژورنال: Applied Physics Letters
سال: 1963
ISSN: 0003-6951,1077-3118
DOI: 10.1063/1.1723567